发明名称 |
POLYVINYL ALCOHOL, POLYVINYL ESTER AND PHOTOSENSITIVE COMPOSITION |
摘要 |
PURPOSE:To obtain a photosensitive composition which can give a flexible, impact-resistant photosensitive resin plate coated with a cured film having good water resistance by using a specified polyvinyl alcohol polymer having a (poly)alkylene oxide as a side chain. CONSTITUTION:A polyvinyl alcohol polymer containing 0.1-30mol% structural units of formula I and having a degree of saponification of 50mol% or above and a degree of polymerization of 10 or above; or a polyvinyl alcohol polymer containing 0.1-30mol% structural units of formula II and having a degree of saponification of 50mol% or above and a degree of polymerization of 10 or above. In formula I and II, R<1> is hydrogen or methyl; R<2> is hydrogen or 1-4C alkyl; R<3> is 1-20C alkylene which may be branched; R<4> is hydrogen or 1-20C alkyl; R<5> is 1-3C alkylene; and (x) is a group of formula III or IV (wherein n is 1-500) which is bonded to R<3> on the side of the oxygen atom. |
申请公布号 |
JPH04298506(A) |
申请公布日期 |
1992.10.22 |
申请号 |
JP19910169453 |
申请日期 |
1991.06.13 |
申请人 |
KURARAY CO LTD |
发明人 |
KINUGAWA MASAAKI;TERADA KAZUTOSHI;MARUYAMA HITOSHI |
分类号 |
C08F8/12;C08F16/02;C08F216/06;C08G81/02;G03F7/038 |
主分类号 |
C08F8/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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