| 摘要 |
<p>PURPOSE:To provide the X-ray mask having in-plane positional accuracy of a mask pattern. CONSTITUTION:Marker patterns 4 formed at every field x1-x4 are detected prior to the drawing of an X-ray mask, and drawing is conducted at every field x1-x4 while successively correcting positions. Continuity among the fields x1-x4 of mask patterns 3a crossing the fields x1-x4 is improved, the X-ray mask, in which these mask patterns 3a are formed accurately at positions according to a design, and the transfer accuracy of said X-ray mask is enhanced remarkably when said X-ray mask is used for X-ray lithography.</p> |
