发明名称 Process for preparing radiation sensitive compound and positive resist composition.
摘要 <p>A radiation sensitive compound prepared by reacting a phenol compound with a quinone diazide sulfonyl halide in a mixture of a solvent having a relative dielectric constant of not larger than 10 and a solvent having a relative dielectric constant of at least 15, which compound is less colored and gives a positive resist composition having a good resolution.</p>
申请公布号 EP0509431(A1) 申请公布日期 1992.10.21
申请号 EP19920106362 申请日期 1992.04.13
申请人 SUMITOMO CHEMICAL COMPANY, LIMITED 发明人 TOMIOKA, JUN;KUWANA, KOJI;NAKANISHI, HIROTOSHI;TAKAGAKI, HIROSHI;DOI, YASUNORI;UETANI, YASUNORI;HANAWA, RYOTARO
分类号 G03F7/022;C08G61/00;C07C303/28;C07C309/76;C07D311/60;H01L21/027 主分类号 G03F7/022
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