发明名称 LIGHT EXPOSURE MASK DEVICE
摘要 PURPOSE:To easily obtain a reticle free from defect according to a desired pattern by installing a liquid crystal drive part applying voltage to a part of a plurality of transparent electrodes on the basis of the input data. CONSTITUTION:When the pattern designing data (d) is inputted into a liquid crystal driving part 2, a CPU drive-controls the drive on the basis of the pattern designing data (d). When voltage is applied on the prescribed transparent electrode 3 in a liquid crystal part 1 by the drive, a liquid crystal pattern 6 is formed. The liquid crystal pattern 6 is based on the pattern designing data (d), and several kinds of liquid crystal patterns 6 can be formed by giving several kinds of pattern designing data (d). Since the liquid crystal part 1 thus formed does not allow the transmission of the wave length of the light used in light exposure, the part irradiated with light is removed when a positive resist is used as photoresist, and the pattern formation on the photoresist film is carried out as shown by the liquid crystal pattern 6 through which light does not transmit.
申请公布号 JPH04296857(A) 申请公布日期 1992.10.21
申请号 JP19910063179 申请日期 1991.03.27
申请人 SHIMADZU CORP 发明人 KASHIHARA MINORU
分类号 G02F1/13;G02F1/133;G03F1/00;G03F1/68 主分类号 G02F1/13
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