发明名称 |
NEGATIVE-WORKING RADIATION-SENSITIVE MIXTURE, AND RADIATION-SENSITIVE RECORDING MATERIAL PRODUCED WITH THIS MIXTURE |
摘要 |
A negative-working radiation-sensitive mixture containing a) a compound which generates a strong acid under the action of actinic radiation, b) a compound having at least two groups crosslinkable by means of acid and c) a polymeric binder which is insoluble in water and soluble or at least swellable in aqueous alkaline solutions, wherein the compound (a) comprises a di-, tri- or tetrahydroxybenzene which may be further substituted, or a polymer containing a di-, tri-, or tetra- hydroxy phenyl radical, is esterified with respectively 2, 3 or 4 sulfonic acids of the formula R-SO3H, and is distinguished by high resolution and high sensitivity over a wide spectral range. It also shows high thermal stability and does not form any corrosive photolysis products on exposure. A radiation-sensitive recording material produced with this mixture is suitable for the production of photoresists, electronic components, printing plates or for chemical milling.
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申请公布号 |
CA2066147(A1) |
申请公布日期 |
1992.10.21 |
申请号 |
CA19922066147 |
申请日期 |
1992.04.15 |
申请人 |
HOECHST AKTIENGESELLSCHAFT |
发明人 |
ROESCHERT, HORST;FUCHS, JUERGEN;SPIESS, WALTER;ECKES, CHARLOTTE;PAWLOWSKI, GEORG;DAMMEL, RALPH |
分类号 |
G03F7/00;C07C303/28;C07C309/65;C07C309/66;C07C309/73;G03F7/004;G03F7/028;G03F7/038;H01L21/027;(IPC1-7):G03C1/73;G03F7/16 |
主分类号 |
G03F7/00 |
代理机构 |
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主权项 |
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