发明名称 NEGATIVE-WORKING RADIATION-SENSITIVE MIXTURE, AND RADIATION-SENSITIVE RECORDING MATERIAL PRODUCED WITH THIS MIXTURE
摘要 A negative-working radiation-sensitive mixture containing a) a compound which generates a strong acid under the action of actinic radiation, b) a compound having at least two groups crosslinkable by means of acid and c) a polymeric binder which is insoluble in water and soluble or at least swellable in aqueous alkaline solutions, wherein the compound (a) comprises a di-, tri- or tetrahydroxybenzene which may be further substituted, or a polymer containing a di-, tri-, or tetra- hydroxy phenyl radical, is esterified with respectively 2, 3 or 4 sulfonic acids of the formula R-SO3H, and is distinguished by high resolution and high sensitivity over a wide spectral range. It also shows high thermal stability and does not form any corrosive photolysis products on exposure. A radiation-sensitive recording material produced with this mixture is suitable for the production of photoresists, electronic components, printing plates or for chemical milling.
申请公布号 CA2066147(A1) 申请公布日期 1992.10.21
申请号 CA19922066147 申请日期 1992.04.15
申请人 HOECHST AKTIENGESELLSCHAFT 发明人 ROESCHERT, HORST;FUCHS, JUERGEN;SPIESS, WALTER;ECKES, CHARLOTTE;PAWLOWSKI, GEORG;DAMMEL, RALPH
分类号 G03F7/00;C07C303/28;C07C309/65;C07C309/66;C07C309/73;G03F7/004;G03F7/028;G03F7/038;H01L21/027;(IPC1-7):G03C1/73;G03F7/16 主分类号 G03F7/00
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