发明名称 PRODUCTION OF NONLINEAR RESISTANCE ELEMENT
摘要 <p>PURPOSE:To improve the transmittance characteristic of about 450nm wavelength exhibiting blue in visible light regions by implanting ions to the nonlinear resistance films on picture element electrodes then subjecting the films to a heat treatment with a laser. CONSTITUTION:This production process consists of a 1st stage for selectively forming the picture element electrodes 2 on an insulating substrate 1, a 2nd stage for continuously forming the nonlinear resistance films 3 and metallic films 4, a 3rd stage for selectively forming the above-mentioned metallic films, a 4th stage for implanting at least one element forming the above-mentioned nonlinear resistance films by an ion implantation method to the nonlinear resistance films, and a 5th stage for executing the heat treatment with a laser, such as argon or excimer. The transmittance is improved by >=80% not only at about 450nm wavelength exhibiting the blue but in the entire wavelength region as well by heat treating the films with the laser and, therefore, the high image display characteristics are obtd.</p>
申请公布号 JPH04295828(A) 申请公布日期 1992.10.20
申请号 JP19910060549 申请日期 1991.03.25
申请人 SEIKO INSTR INC 发明人 YABE SATORU
分类号 G02F1/136;G02F1/1365 主分类号 G02F1/136
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