| 摘要 |
PURPOSE:To obtain a positive type resist composition having excellent depth of focus and sensitivity free from problems such as increase in development residue, containing a specific polyhydric phenol compound. CONSTITUTION:A positive type resist composition containing a compound shown by formula I (R1-5 are H, alkyl, alkenyl, cycloalkyl or aryl). The composition may further contain a quinonediazidosulfonic ester of a phenol compound shown by formula II (R6-10 are H, alkyl, alkenyl, etc.). The compound shown by formula I is obtained by condensing pyrogallol with a ketone in the presence of an acid catalyst. HCl or H2SO4 is used as the acid catalyst. |
