发明名称 |
THIN FILM THERMAL HEAD AND ITS MANUFACTURING METHOD OF PROTECTIVE FILM |
摘要 |
A method for manufacturing the protecting film of thermal head using the sputtering system comprising a sputter chamber, a cathode applying the RF power, a substrate holder, a gate valve and a vacuum pump. The method is executed by the following steps: installing the target of the wanted protecting material on the cathode and a substrate on the substrate holder; injecting non-reactive gas into the sputter chamber through the gas pipe; applying the RF power on the target side; applying lower RF power than that of the target side on the substrate side. This method is useful for preventing micro cracks and projecting parts from forming in the protecting film.
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申请公布号 |
KR920009367(B1) |
申请公布日期 |
1992.10.15 |
申请号 |
KR19900006724 |
申请日期 |
1990.05.11 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
HONG, SOK - KYONG |
分类号 |
H01L21/00;H04N1/032;(IPC1-7):H01L21/00 |
主分类号 |
H01L21/00 |
代理机构 |
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