| 摘要 |
PURPOSE:To prevent the formation of NOx and to make all harmful gases harmless at a low running cost by heating, oxidizing and decomposing a waste CVD gas and then oxidizing the treated gas by contact with an oxidation catalyst in the presence of oxygen. CONSTITUTION:The waste CVD gas treating device 1 is formed with a heating, oxidizing and decomposing device 2 and a catalytic reaction vessel 3. The waste gas from a waste gas inlet pipe 4, the nitrogen from a nitrogen inlet pipe 5 and the air from an air inlet pipe 6 are introduced into the reaction part 11 of the device 2 to heat, oxidize and decompose the waste gas. The treated gas contg. the reaction product is washed with cooling water 12 in a washing part 13, the waste water contg. the solubles such as F2 and SiF4, SiO2, etc., is discharged outside the system, the waste gas is introduced into the catalytic reaction vessel 3 to oxidize CO, etc., hence the waste gas is cleaned and made harmless. Consequently, the formation of NOx is prevented at a low running cost, and all the harmful gases are made harmless. |
