| 摘要 |
PURPOSE:To prevent stray light from an inside wall by evenly finishing an inside wall of a pellicle frame for mounting a pellicle on a photomask. CONSTITUTION:The pellicle frame 2 is mounting on the photomask so as to surround a pattern face. The pellicle 3 is stuck on the pellicle frame 2 so as to cover the pattern face. And an irregular reflection protective material 20 such as a reflection protective layer processed to be flat is provided on the inside wall 2a of the pellicle frame 2. But, stray light reflected from the inside wall 2a of the pellicle frame 2 is made incident on a photoelectric conversion element. Then, a low reflective material having low reflective property at least to wavelength range of probe light so that stray light is not made incident and the irregular reflection protective member 20a is provided on the inside wall of the pellicle frame 2. |
