Radiation sensitive mixture, containing groups which are labile in acid environment and method for fabrication of relief patterns and relief images.

摘要

The invention relates to a radiation-sensitive mixture containing (a) a water-soluble polymeric binder which is soluble in aqueous alkaline solutions, and (b) an organic compound whose solubility in an aqueous alkaline developer is increased by exposure to acid and which contains at least one acid-cleavable group and, in addition, a group which forms a strong acid on exposure to radiation, and also, in addition, (c) an alkyl- or arylsulphonate of a hydroxy-aromatic compound. This mixture is suitable for fabricating relief patterns.