发明名称 A PROCESS OF FORMING A PATTERNED POLYIMIDE FILM AND ARTICLES INCLUDING SUCH A FILM
摘要 A process of forming a patterned polyimide film includes the step of conversion of a polyimide precursor (4 min ) into polyimide (4). The improvement is imidizing the precursor by means of a chemical imidizing agent. Typically a film (4 min ) of polyimide precursor is formed on a substrate, and a mask (5 min ) which is negative with respect to the desired pattern is formed on the film. The film is contacted through the mask with a chemical imidizing agent to effect imidization of unmasked portions,thereby forming polyimide. The mask and masked portions of the film are removed, leaving the desired polyimide pattern (4). High temperatures and harmful etchants can be avoided.
申请公布号 EP0389195(A3) 申请公布日期 1992.10.14
申请号 EP19900302847 申请日期 1990.03.16
申请人 HITACHI, LTD. 发明人 FUJISAKI, KOJI;NUMATA, SHUNICHI;MIWA, TAKAO;IKEDA, TAKAYOSHI;SHIMANOKI, HISAE
分类号 G03F7/037;C08J5/18;C08L79/08;C09D179/08;G02F1/1337;G03F7/00;G09F9/35;G11B5/31;H01B3/30;H01L21/312;H01L21/3213;H01L21/60;H01L23/498;H01L23/556;H01L27/10;H05K1/03;H05K3/28;H05K3/46 主分类号 G03F7/037
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