FORMING METHOD FOR ALIGNMENT MARKER

摘要

PURPOSE:To make it possible to form an alignment marker quickly on a semiconductor wafer, to improve the reproducibility of an element by avoiding s wafer damage when a micromechanism-device lamp is manufactured and to improve the yield rate. CONSTITUTION:Optical energy 2 is selectively cast on the first main surface of a semiconductor wafer 5, and a through hole is provided as an alignment marker in the semiconductor wafer 5. The forming method of the alignment marker and the pattern forming method using the semiconductor wafer have these features.