| 摘要 |
PURPOSE:To improve productivity and the wear resistance, etc., of the thin film at the time of forming various functional thin films on a transparent glass substrate by using a DC reactive sputtering method to cover the functional thin film with a TiSiON thin film. CONSTITUTION:The TiSiON thin film or composite thin film consisting essentially of TiSiON having >=10Angstrom thickness is laminated on the surface of a transparent glass substrate by DC reactive sputtering as the odd-numbered layer from the surface. The thin film of at least one kind of metal among Ti, Zr, Sn, Ta, In, Ni, Cr and Zn, their oxides or nitrides or nitrogen oxides is laminated as the even-numbered layer, and a TiSiON thin film or a composite thin film consisting essentially of TiSiON is used as the outermost surface layer. The obtained thin film coating layer has a high wear resistance so that the haze value after the Taber abrasion at 500g load by the abrasion wheel CS-10F and 1000 revolutions is <=2.5. |
