| 摘要 |
<p>PURPOSE:To allow dyeing in a short period of time with a thin film thickness and to form fine dyed patterns with high accuracy without using surplus equipment by using a specific photosensitive resin for dyeing to a dye element colored layer. CONSTITUTION:The photosensitive resin prepd. by adding a water soluble bis- azide compd. as a crosslinking agent to the three-dimensional polymer of a compd. having the structure of N-vinyl-2-pyrrolidinone and quaternary amine and having a polymerizable unsatd. bond and the compd. having the structure expressed by the formula I is applied on a substrate. The resin is selectively exposed and is developed with water to form the patterns of the resin. The patterns are dyed to form dyed patterns. In the formula, R1 denotes H, CH3; R2 denotes CnH2n+1(n1-8). The color filter is obtd. with the thin film thickness under the dyeing conditions of the temp. near room temp. and the short period of time in this way; in addition, the resolving power increases and the pattern registration is facilitated. The development with water is possible and environmental pollution does not arise.</p> |
