| 摘要 |
PURPOSE:To form a conductor line without lowering a critical current density regarding the formation method of the conductor line composed of a superconductor thin film. CONSTITUTION:At a process to from a conductor line composed of an oxide superconductor thin film in which a unit lattice forms a layerlike structure on a substrate such as MgO, SrTiO3 or the like provided with (100) on a substrate face, the formation method of a superconductor line is constituted so as to be featured as follows: a conductor-line formation region at the substrate is etched in advance; a recessed part is formed; electrodes are formed on both ends of the recessed part; and, after that, the oxide superconductor thin film is patterned between the electrodes by a lift-off method. |
