发明名称 |
MASKS FOR HIGH QUALITY IMAGES FROM TOTAL INTERNAL REFLECTION HOLOGRAMS |
摘要 |
In order to reduce or eliminate undesired fringe patterns occurring in images generated by total internal reflection holograms, the mask (20) is provided with an anti-reflection coating (19) on at least one of its underside surface (26) and top surface (16). An anti-reflection coating (19) provided on the underside surface (26) of the mask (20) may also increase the depth of focus of images generated by total internal reflection holograms. <IMAGE> |
申请公布号 |
EP0462698(A3) |
申请公布日期 |
1992.10.07 |
申请号 |
EP19910304208 |
申请日期 |
1991.05.10 |
申请人 |
HOLTRONIC TECHNOLOGIES LIMITED |
发明人 |
BROOK, JOHN EDWARD;CLUBE, FRANCIS STACE MURRAY |
分类号 |
G03F7/20;G03F1/00;G03F1/46;G03H1/04;H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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