发明名称 MASKS FOR HIGH QUALITY IMAGES FROM TOTAL INTERNAL REFLECTION HOLOGRAMS
摘要 In order to reduce or eliminate undesired fringe patterns occurring in images generated by total internal reflection holograms, the mask (20) is provided with an anti-reflection coating (19) on at least one of its underside surface (26) and top surface (16). An anti-reflection coating (19) provided on the underside surface (26) of the mask (20) may also increase the depth of focus of images generated by total internal reflection holograms. <IMAGE>
申请公布号 EP0462698(A3) 申请公布日期 1992.10.07
申请号 EP19910304208 申请日期 1991.05.10
申请人 HOLTRONIC TECHNOLOGIES LIMITED 发明人 BROOK, JOHN EDWARD;CLUBE, FRANCIS STACE MURRAY
分类号 G03F7/20;G03F1/00;G03F1/46;G03H1/04;H01L21/027 主分类号 G03F7/20
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