METHOD FOR ETCHING DEMARCATED SUBSTRATE

摘要

PURPOSE: To provide a method for etching delineated holes by using a silver mask formed by silver diffusion transfer imaging. CONSTITUTION: A photosensitive material contg. silver halide is applied on a substrate having a diffusion transfer machine on its surface or second substrate. This photosensitive material is exposed and developed to the pattern form of the graphics to be etched. Silver pattern films are then formed on the substrate by a silver diffusion transfer method. The silver halide material layers are removed and the silver patterns are made to remain. The substrate of the areas not coated with the silver is removed by an etching treatment, by which etching patterns are formed.