发明名称 Heterojunction bipolar transistor and method of manufacturing the same.
摘要 <p>A high-cut-off frequency, high-speed HBT is obtained by suppressing the diffusion of impurities to the utmost by lowering a heat treatment temperature in the step subsequent to the formation of a high concentration base layer (5). A base electrode (15) for a base layer (5) is made of a metal or an intermetallic compound which extends the emitter layer (6) to reach at least a part of the base layer (5). The metal or intermetallic compound forms Schottky barrier with an emitter layer (6) having a wide forbidden width ,and ohmic contacts with the base layer (5) with a narrow forbidden band. The barrier potential of the Schottky junction formed between the intermetallic compound or metal and the emitter layer (6) is higher than the diffusion potential of a pn junction between the base layer (5) and the emitter layer (6). &lt;IMAGE&gt;</p>
申请公布号 EP0507454(A1) 申请公布日期 1992.10.07
申请号 EP19920301886 申请日期 1992.03.05
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 MORIZUKA, KOUHEI
分类号 H01L29/165;H01L21/28;H01L21/331;H01L29/423;H01L29/45;H01L29/47;H01L29/73;H01L29/737 主分类号 H01L29/165
代理机构 代理人
主权项
地址