| 摘要 |
<p>PURPOSE:To obtain an exposure mask and an X-ray projection exposure device with which the heat generated by absorption of X-rays can be prevented and also the lowering of mask accuracy due to thermal expansion of an exposure mask can be prevented. CONSTITUTION:The title exposure mask 10 is used for X-ray projection exposure, Invar is used for a substrate 17, and the title X-ray projection exposure device is equipped with a cooling means 16, used for the above-mentioned exposure mask, provided on the retaining stand 11 with which the exposure mask is retained.</p> |
