发明名称 Method of controlling the chemical structure of polymeric films by plasma deposition and films produced thereby
摘要 A method of controlling the chemical structure of polymeric thin films formed by plasma deposition and films produced by these methods, is disclosed. An important aspect of the method involves controlling the temperature of the substrate and the reactor so as to create a temperature differential between the substrate and reactor such that the precursor molecules are preferentially adsorbed or condensed onto the substrate either during plasma deposition or between plasma deposition steps. The polymeric thin films produced by the methods of this invention exhibit more defined and predictable chemical structures and properties than conventional plasma deposited films.
申请公布号 US5153072(A) 申请公布日期 1992.10.06
申请号 US19910675531 申请日期 1991.03.25
申请人 THE BOARD OF REGENTS OF THE UNIVERSITY OF WASHINGTON 发明人 RATNER, BUDDY D.;LOPEZ, GABRIEL P.
分类号 B05D3/06;B05D7/24 主分类号 B05D3/06
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