发明名称 HEMT device with doped active layer
摘要 A high-mobility semiconductor device having GaAs/AlGaAs hetero junction of the present invention comprises a GaAs active layer and a GaAs contact layer, with a high-carrier concentration AlGaAs barrier layer interposed therebetween, so that the effective carrier concentration of the active layer can be increased and thus the thickness thereof can be reduced, resulting in an increase in the trans-conductance and improvement in the high frequency characteristics. Since the presence of the AlGaAs barrier layer enables selecting etching, such element characteristics as the plane uniformity and reproducibility can be improved.
申请公布号 US5153682(A) 申请公布日期 1992.10.06
申请号 US19910659487 申请日期 1991.02.25
申请人 MITSUBISHI MONSANTO CHEMICAL COMPANY;MITSUBISHI KASEI CORPORATION 发明人 GOTO, HIDEKI;KATO, MASANORI;KAWAKAMI, TATSUHIKO
分类号 H01L29/205;H01L21/20;H01L21/338;H01L29/778;H01L29/80;H01L29/812 主分类号 H01L29/205
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