发明名称 |
HEMT device with doped active layer |
摘要 |
A high-mobility semiconductor device having GaAs/AlGaAs hetero junction of the present invention comprises a GaAs active layer and a GaAs contact layer, with a high-carrier concentration AlGaAs barrier layer interposed therebetween, so that the effective carrier concentration of the active layer can be increased and thus the thickness thereof can be reduced, resulting in an increase in the trans-conductance and improvement in the high frequency characteristics. Since the presence of the AlGaAs barrier layer enables selecting etching, such element characteristics as the plane uniformity and reproducibility can be improved.
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申请公布号 |
US5153682(A) |
申请公布日期 |
1992.10.06 |
申请号 |
US19910659487 |
申请日期 |
1991.02.25 |
申请人 |
MITSUBISHI MONSANTO CHEMICAL COMPANY;MITSUBISHI KASEI CORPORATION |
发明人 |
GOTO, HIDEKI;KATO, MASANORI;KAWAKAMI, TATSUHIKO |
分类号 |
H01L29/205;H01L21/20;H01L21/338;H01L29/778;H01L29/80;H01L29/812 |
主分类号 |
H01L29/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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