摘要 |
The invention comprises compounds of formula <FORM:0978550/C1/1> wherein R1 is a benzene residue, R2 is a benzene, cycloalkyl or alkyl residue, R3 is an alkyl residue of at least 3 carbon atoms, X is methoxy or ethoxy and the molecule contains at least one nuclear-bound sulphonic acid group. The compounds are manufactured by sulphonation of the corresponding unsulphonated precursors, the latter being obtained by reacting together the following amine and ester <FORM:0978550/C1/2> <FORM:0978550/C1/3> wherein A is methyl or ethyl. Other substituents in the benzene residues, such as halogen (e.g. Cl), ethyl, methyl or further ethoxy or methoxy groups may also be present. Starting materials. Details are given of the preparation of the following by known methods: 1-stearoylamino -4- ethoxybenzene, 1-amino (and nitro) -2- stearoylamino -5- ethoxy benzene, 1-stearoylamino -2- methoxy -4- amino (and nitro) benzene, 1-methoxy -3- amino (and nitro) -4- lauryl amino benzene.
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