发明名称 LITHOGRAPHIC DEVICE USING SYNCHROTRON LOCUS RADIATION LIGHT
摘要 PURPOSE:To uniformly perform reduction exposure in all directions by utilizing circularly polarized light so as to reduce the scattering loss and scattering the light two times. CONSTITUTION:The circularly polarized component of synchrotron radiation light which is deviated upward or downward from the orbital plane of electrons is caught and projected upon the first crystalline substrate 5. The polarized light is reduced in the horizontal direction by utilizing Bragg scattering caused by the substrate 5. Then the scattered X rays 6 are projected upon the second crystalline plate 7 and reduced in the vertical direction by utilizing the Bragg scattering of the plate 7.
申请公布号 JPH04279021(A) 申请公布日期 1992.10.05
申请号 JP19910000665 申请日期 1991.01.08
申请人 NEC CORP 发明人 HIROZAWA ICHIRO
分类号 H01L21/027 主分类号 H01L21/027
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