| 摘要 |
PURPOSE:To provide such an energy beam sensitive negative resist material that is excellent in adhesion with substrate, resolvability and dimensional controllability, etc. CONSTITUTION:In an energy beam sensitive negative resist inclusive of resin, a cross linking agent and an acid generator being dissolved in water or alkali aqueous solution, it is a resist material being featured that volume variation in the promotion of being negatived should be less than 5%. As for the cross linking agent, spiroortho-carbonates, bicycloorthoesters, spiroorthoesters or so are exemplified, while as for the acid generator, an organic compound inclusive of onium salt, a trihalomethly1 group is exampled. Especially, it is useful in micro-working technology being required for a quarter micron level. |
