发明名称 METHOD FOR CORRECTING PHOTOMASK
摘要 <p>PURPOSE:To improve workability by assigning the position coordinates at desired two points, automatically positioning an X-Y stage at specified intervals along a straight line connecting these two points to each other and irradiating this position with a laser beam. CONSTITUTION:A slit size is set from the size of a defect and the beginning point P1 of the defect is matched with the corner of a slit image 41 by moving the X-Y stage. A control system takes in the P1 coordinate from a coordinate counter and stores the same. The end point of Pm of the defect is similarly matched and the control system stores the Pm coordinate. The X-Y stage is then returned to the P1 and is matched with the slit image 41. The moving mode of the X-Y stage is set at an INDEX mode and the 1st correction is executed by shooting the laser. The X-Y stage is automatically moved to the 2nd correction position set from the previously calculated pitch feed rate and moving direction and the 2nd correction is executed in the state of slightly overlapping the laser beam.</p>
申请公布号 JPH04271347(A) 申请公布日期 1992.09.28
申请号 JP19910053724 申请日期 1991.02.27
申请人 NEC CORP 发明人 YOSHINO YOICHI
分类号 G03F1/72;H01L21/027 主分类号 G03F1/72
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