| 摘要 |
<p>PURPOSE:To allow the removal of pellicle frames in the state of maintaining the cleanliness of the pattern forming part of a photomask and to reduce the amt. of a solvent to be used by putting the pellicle frames to be immersed into the solvent in a hermetic state. CONSTITUTION:This device is constituted by forming respective grooves 14, 15 formed to allow the free insertion of the respective pellicle frames 52, 53 to the photomask mounting side of caps 12, 13 to be mounted on the front and rear surfaces of the photomask 51, providing outer sealing members 16, 17 and inner sealing members 18, 19 on the respective photomask mounting surfaces 12a, 13a on the sides outer and inner than the grooves 14, 15, forming through-holes 20, 21, 22, 23 communicating with the grooves 14, 15 through the caps 12, 13, and further, providing a tightening mechanism 41 for pressing the caps 12, 13 via cap supporting parts 24, 25 to the photomask 51.</p> |
