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发明名称
STRUCTURE BODY AND METHOD FOR IMPROVEMET OF INTEGRITY OF GATE OXIDE OF SEMICONDUCTOR FORMED BY RECESSED HERMETICALLY SEALED SIDEWALL FIELD OXIDATION METHOD
摘要
申请公布号
JPH04268747(A)
申请公布日期
1992.09.24
申请号
JP19910337997
申请日期
1991.11.28
申请人
NCR CORP
发明人
SUTEIIBUN ESU RII
分类号
H01L21/76;H01L21/316;H01L21/32;H01L21/762
主分类号
H01L21/76
代理机构
代理人
主权项
地址
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