| 摘要 |
<p>Imaging at sub-micron dimensions - at dimensions ordinarily thought to approximate those within diffraction limitations of the chosen imaging radiation - is expedited by use of a new category of phase masks. The new mask structure provides for phase shifting by use of waveguides. Waveguides of such dimensions, material, and spacing as to accommodate image resolution impairment, may consist of filled or unfilled apertures or of protuberances, all of constant length equal to the thickness of the mask layer in which constructed.</p> |
