Photosensitive polymer composition.

摘要

A photosensitive polymer composition comprising, in admixture, a polymer predominantly comprising a recurring unit of the formula ( I ): <CHEM> wherein X is a tri- or tetravalent organic group, Y is a divalent organic group, and n is equal to 1 or 2 and a compound having a urea bond of the formula ( II ): <CHEM> wherein R<1> is a group having a functional group capable of forming a dimer or polymer upon exposure to radiation, R<2> and R<3> are independently a hydrogen atom or a monovalent organic group is shelf stable and applicable as relatively thick coatings having sufficient photosensitivity to form semiconductor element surface protective films.