发明名称 Method for making resist patterns for large area circuit base.
摘要 <p>This invention presents a method of producing resist patterns on a large substrate base for use in active matrix type display panels. A feature of the invention is the display matrix circuit section which is located on the same substrate base as the display control circuit section. In the production of such a substrate base by the process of etching photoresist patterns, more than two different types of circuit printing processes are employed, depending on the resolution accuracy required for the circuit patterns for the matrix display circuit section, the display control circuits and the electrode terminal peripheral regions.</p>
申请公布号 EP0505227(A2) 申请公布日期 1992.09.23
申请号 EP19920400549 申请日期 1992.03.03
申请人 GTC CORPORATION 发明人 AKIMOTO, YASUMASA;KOBAYASI, MASAYOSI
分类号 G02F1/133;G02F1/1343;G02F1/1345;G02F1/136;G02F1/1362;G02F1/1368;G03F7/12;G03F7/16;H01L21/027;H01L21/30;H01L21/336;H01L21/77;H01L21/84;H01L27/12;H01L29/78;H01L29/786;H05K3/00 主分类号 G02F1/133
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