In a process for the production of thin films and epitaxial layers by gas-phase deposition, intramolecularly stabilized organometallic compounds are employed as a source of metal.
申请公布号
US5149853(A)
申请公布日期
1992.09.22
申请号
US19910789518
申请日期
1991.11.08
申请人
MERCK PATENT GESELLSCHAFT MIT BESCHRAENKTER HAFTUNG
