发明名称 MANUFACTURE OF SEMICONDUCTOR DEVICE
摘要 PURPOSE:To provide a semiconductor device having a reliable electrode wiring of metal silicide. CONSTITUTION:An electrode wiring composed of metal silicide 15 is formed on a semiconductor substrate 11. The metal silicide is covered with silicon 21, which is heat-treated to form a silicon oxide 24 in order to prevent the abnormal oxidation of the metal silicide 15.
申请公布号 JPH04266031(A) 申请公布日期 1992.09.22
申请号 JP19910026298 申请日期 1991.02.20
申请人 TOSHIBA CORP 发明人 KATADA TOMIO
分类号 H01L21/285;H01L21/28;H01L21/3205;H01L21/336;H01L21/768;H01L23/52;H01L29/423;H01L29/43;H01L29/49;H01L29/78 主分类号 H01L21/285
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