MANUFACTURE OF THIN FILM TRANSISTOR ARRAY DEVICE

摘要

PURPOSE:To provide an efficient method of manufacturing a thin film transistor array device which has a low possibility of occurrence of a defect, by improving the pattern of source wiring in a method of manufacturing a thin film transistor array which can be formed of two photo-masks by exposing a photo-resist through a gate wiring as a mask from the rear surface side of a transparent substrate so as to form a photoresist pattern which is aligned with the gate wiring. CONSTITUTION:Simultaneous with the formation of source wiring 7 and pixel electrodes 8, the source wiring 7 is formed thereto with branch parts 7a. Accordingly, even though a breakage occurs at the crossing between the branch part 7a and a gate wiring 2, no defects occur.