PLASMA CHEMICAL VAPOR DEPOSITION APPARATUS,申请号KR19880021359U-传众专利搜索

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发明名称	PLASMA CHEMICAL VAPOR DEPOSITION APPARATUS
摘要
申请公布号	KR920006653(Y1)	申请公布日期	1992.09.21
申请号	KR19880021359U	申请日期	1988.12.23
申请人	SAMSUNG ELECTRONICS CO., LTD.	发明人	JANG, KYU - JONG
分类号	H01L21/205;(IPC1-7):H01L21/205	主分类号	H01L21/205
代理机构		代理人
主权项
地址

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