| 摘要 |
<p>PURPOSE:To provide the manufacturing method for the liquid crystal display device which has high productivity and high reliability by improving a method for applying resist onto gate electrode lines when an inter-layer insulating film is formed on the gate electrode lines by selective anode oxidation. CONSTITUTION:The gate electrode lines and source electrode lines are arrayed on a glass substrate in matrix, thin film semiconductor elements are arranged at their intersection parts, and end parts of both the electrode lines form electrode line pad parts, thus manufacturing the liquid crystal display device. After a metallic thin film forming the gate electrode lines is formed, a screen plate 42 which is formed of a mesh material in a frame shape covering only the peripheral part on the glass substrate is superposed. Then a roller 41 with resist is run only on the screen plate 42 to protect only the electrode line pad part on the metallic thin film by the resist, and the selective anode oxidation of the glass substrate is carried out to form the interlayer insulating film in a desired shape on the surface of the gate line surface.</p> |
