| 摘要 |
A phase shifting mask includes an opaque layer (26) having three adjacent apertures (28a,b,c) which comprise a predetermined pattern, and at least two phase shifters (50,52) each having a different shift amount. At least two of the apertures (28b,c) are covered with the phase shifters (50,52) so that a phase difference between each two adjacent apertures is approximately 120 DEG (1/3 lambda ). Therefore, light intensity at a medial area between each two adjacent apertures is decreased in comparison with independent lights passing through the apertures. <IMAGE> |
