发明名称 METHOD FOR COMPARING AND INSPECTING MASK PATTERN DATA
摘要 PURPOSE:To properly execute alignment correction by considering a pattern irregularity due to the movement of a stage to an alignment allowable value to obtain a variation value corresponding to each scanning. CONSTITUTION:When it is defined that the alignment correction values of data patterns 1, 2 and mask patterns 4, 5 are X1, Y1, X2, Y2 and a stage moving distance between respective patterns 1, 2 is l1, an alignment correction variation due to stage movement is expressed by x=(X2-X1)/l1 and y=(Y2-Y1)/l1. When a stage moving distance from the data pattern 2 to a data pattern 3 is l2, the alignment correction value of the pattern 3 can be estimated as X3=X1+ x(l1+l2) and Y3= y(l1+l2). When an alignment allowable area 8 is defined by X3+alpha and Y+beta, the alignment correction can be executed even in the case of a pattern irregularity due to stage movement.
申请公布号 JPH04260978(A) 申请公布日期 1992.09.16
申请号 JP19910007416 申请日期 1991.01.25
申请人 MITSUBISHI ELECTRIC CORP 发明人 HIROSUE YOSHIYUKI
分类号 G06T7/60 主分类号 G06T7/60
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