| 摘要 |
PURPOSE:To provide a device and method for developing a resist film capable of uniformly developing with the necessary and minimum quantity of a developer in respect to a device and method for developing a resist film on a subject to be developed which takes the shape other than a disk. CONSTITUTION:Frames 23a, 23b are installed in the peripheral part of a plate 22 and a subject to be developed 20 is mounted thereon using the frames 23a, 23b as a supporting part to form a gap corresponding to the height of the frames 23a, 23b between the plate 22 and the subject to be developed 20. The device consists of a container 26 where the subject to be developed 20 can be developed by filling the gap with a developer, a holder 25 which is mounted on and fixes the subject to be developed 20 and movable vertically, and an inlet 24a and an outlet 24b of the developer installed in two places of the frames 23a, 23b. |
