发明名称 POSITIVE TYPE PHOTOSENSITIVE ELECTRODEPOSITABLE RESIN COMPOITION
摘要 <p>PURPOSE:To provide a positive type photosensitive electrodepositable resin compsn. capable of forming a uniform thin film (resist) even on a body of a large area or a complicated shape by coating, having superior efficiency of deposition, improved photosensitivity and developability an hardly affecting the environment. CONSTITUTION:This resin compsn. contains (A) (i) a polymer having an ionic hydrophilic group and a branched group unstable to acids in the side chain or (ii) a mixture of a polymer having an ionic hydrophilic group in the side chain with a polymer having a branched group unstable to acids in the side chain, (B) a neutralizing agent for neutralizing the ionic hydrophilic group, (C) an acid generating agent which generates an acid under irradiation with light and (D) an aq. medium.</p>
申请公布号 JPH04258957(A) 申请公布日期 1992.09.14
申请号 JP19910020922 申请日期 1991.02.14
申请人 NIPPON PAINT CO LTD 发明人 MATSUMURA AKIRA
分类号 G02B5/20;C09D5/44;G03F7/004;G03F7/029;G03F7/039;G03F7/16;H01L21/027;H05K3/06 主分类号 G02B5/20
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