发明名称 MANUFACTURE OF ACTIVE MATRIX SUBSTRATE
摘要 <p>PURPOSE:To prevent a pixel electrode from peeling by surface-treating an organic transparent insulating film in the atmosphere of inert gas which is made plasma. CONSTITUTION:Thin film transistors 30 are arranged on a substrate 1 in matrix to form a thin film transistor array. Contact holes 12 are made by applying a transparent insulating film 10 to the surface of the array and patterning. The precision of the surface is improved by surface-treating the transparent insulating film 10 in the atmosphere of inert gas made plasma. After that, pixel electrodes 11 are obtained by forming a conductive film on the surface of the transparent insulating film 10 and patterning. Thereby adhesive strength between the transparent insulating film 10 and the pixel electrode 11 is increased.</p>
申请公布号 JPH04257826(A) 申请公布日期 1992.09.14
申请号 JP19910020074 申请日期 1991.02.13
申请人 SHARP CORP 发明人 UJIMASA HITOSHI;TANAKA HIROHISA
分类号 G02F1/1343;G02F1/136;G02F1/1368 主分类号 G02F1/1343
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