发明名称 |
MANUFACTURE OF ACTIVE MATRIX SUBSTRATE |
摘要 |
<p>PURPOSE:To prevent a pixel electrode from peeling by surface-treating an organic transparent insulating film in the atmosphere of inert gas which is made plasma. CONSTITUTION:Thin film transistors 30 are arranged on a substrate 1 in matrix to form a thin film transistor array. Contact holes 12 are made by applying a transparent insulating film 10 to the surface of the array and patterning. The precision of the surface is improved by surface-treating the transparent insulating film 10 in the atmosphere of inert gas made plasma. After that, pixel electrodes 11 are obtained by forming a conductive film on the surface of the transparent insulating film 10 and patterning. Thereby adhesive strength between the transparent insulating film 10 and the pixel electrode 11 is increased.</p> |
申请公布号 |
JPH04257826(A) |
申请公布日期 |
1992.09.14 |
申请号 |
JP19910020074 |
申请日期 |
1991.02.13 |
申请人 |
SHARP CORP |
发明人 |
UJIMASA HITOSHI;TANAKA HIROHISA |
分类号 |
G02F1/1343;G02F1/136;G02F1/1368 |
主分类号 |
G02F1/1343 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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