| 摘要 |
PURPOSE:To prevent electrification of a resist film surface which is generated at the time of exposure of X rays and enable a dimension accuracy to be improved by allowing photoelectrons, etc., which are generated from a substrate to be exposed to be absorbed by a film with a high electrical conductivity on the substrate which is exposed to X rays and then to flow to an outside through a conductive portion where a means for fixing the substrate is provided. CONSTITUTION:At the time of X-rays exposure for transferring a pattern on a mask 26 to a resist film 23, photoelectrons, etc., which are generated from a substrate to be exposed 2 are absorbed by a conductive film 22, pass through a ground spring 25a and a substrate check 24, and then flow to a chamber 1. Also, electrons which are generated from an X-rays mask structure body 26 also pass through a mask conductive film, a block 28, and a mask chuck 27 and then flow to the chamber 1. In this case, a plurality of ground springs 25 are provided and a proximity gear and only the ground spring 25a which does not give influence are allowed to conduct with the conductive film 22. Then, the ground spring 25 are operated along with a move of a step at the time of X-rays exposure, thus enabling a proximity gap to be maintained to be constant and X rays to be exposed. |
