DEVELOPER FOR POSITIVE TYPE RESIST

摘要

PURPOSE:To provide developing solvents ensuring high sensitivity, high contrast and superior resolution for a positive type resist and hardly reducing the thickness of the unexposed part of the resist. CONSTITUTION:This developer for a positive type resist contains xylene and 1,4-dioxane or further contains other commonly used solvent. An example of the resist is a positive type resist based on an alpha-substd. acrylic polymer. This developer enables the formation of a high-quality superfine pattern and is useful to produce a device having a superfine structure.