发明名称 MASK CONTAMINATION DETECTION EQUIPMENT FOR X-RAY SEMICONDUCTOR EXPOSURE ALIGNER
摘要 <p>PURPOSE:To exchange an X-ray mask at an adequate timing, by detecting the contamination degree of the X-ray mask, on the basis of the amount of light passing through the X-ray mask. CONSTITUTION:The visible light which has entered objectives 24, 25 is relayed by a relay lens 26, and is supplied to a light sensor 17, which generates electric signal proportional to the intensity of the received visible light, and supplies the signal to a signal processing equipment 28 via a conductor wire 27. The signal processing equipment 28 compares the supplied electric signal with an electric signal whose level is corresponding to the state that an X-ray mask 13 is not contaminated, and judges the contamination degree of the X-ray mask 13, on the basis of the comparison results. When the contamination degree exceeds a limit, the X-ray mask 13 is exchanged. Thereby the X-ray mask 13 can be exchanged at an adequate timing.</p>
申请公布号 JPH04254318(A) 申请公布日期 1992.09.09
申请号 JP19910035068 申请日期 1991.02.06
申请人 SUMITOMO HEAVY IND LTD 发明人 HAMADA SHIRO
分类号 G01N21/88;G01N21/94;G01N21/956;G03F1/22;H01L21/027;H01L21/30 主分类号 G01N21/88
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