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经营范围
发明名称
NOVOLAK RESIN FOR POSITIVE PHOTORESIST
摘要
申请公布号
EP0271199(B1)
申请公布日期
1992.09.09
申请号
EP19870309646
申请日期
1987.10.30
申请人
SUMITOMO CHEMICAL COMPANY, LIMITED
发明人
OI, FUMIO;OSAKI, HARUYOSHI;FURUTA, AKIHIRO;UEMURA, YUKIKAZU;NINOMIYA, TAKAO;UETANI, YASUNORI;HANABATA, MAKOTO
分类号
G03C1/72;C08G8/00;C08G8/08;G03F7/023
主分类号
G03C1/72
代理机构
代理人
主权项
地址
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