Apparatus for developing photoresist.

摘要

The photoresist developing apparatus is adapted for controlling the development of a photoresist (2) formed on a light-transmitting substrate (1) bearing a latent image produced by exposure to an irradiation for equi-pitch patterns. Monitor light diffracted by the equi-pitch patterns produced as the development of the resist advances is detected after the diffracted light is totally reflected at the opposite surface (1b) to the surface (1a) through which it is let in and diffracted again by the equi-pitch patterns. The developing process is controlled according to a signal obtained as the result of the detection. <IMAGE>