| 摘要 |
<p>PURPOSE:To improve an yield by forming plural row lines and column lines on an insulating substrate and connecting column lines which are exposed from an insulating layer above the column lines to terminal parts electrically in the vicinity of a terminal area. CONSTITUTION:Photoresist 32 applied over the transparent insulating substrate 31 is patterned by removing the part corresponding to a gate line, etc., and an entire-surface gate material 33 is adhered to an entire surface. This resist is also peeled to form a metal mask covering a gate terminal and a drain terminal, and an insulating film 40, an amorphous silicon film 41, and an N type amorphous silicon film 42 with high density are formed. The insulating film 40, etc., is not formed in an area corresponding to the terminal part by using this metal mask 39, and consequently the gate line 35 is extended to this area to expose the surface of the gate line. Therefore, a gate terminal 37 and a gate line 35 can be connected directly and electrically and a contact hole is omitted to reduce contact defects, etc.</p> |
