FORMATION OF POLYCRYSTALLINE SILICON FILM,申请号JP19910008203-传众专利搜索

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发明名称	FORMATION OF POLYCRYSTALLINE SILICON FILM
摘要
申请公布号	JPH04252025(A)	申请公布日期	1992.09.08
申请号	JP19910008203	申请日期	1991.01.28
申请人	NEC CORP	发明人	SAKAI AKIRA
分类号	H01L21/203;H01L21/205;H01L21/28	主分类号	H01L21/203
代理机构		代理人
主权项
地址

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