发明名称 |
PLASMA PINCH SYSTEM AND METHOD OF USING SAME |
摘要 |
PLASMA PINCH SYSTEM AND METHOD OF USING SAME A plasma pinch system includes a fluid-jet pinch device for establishing a plasma source composed of a tenuous vapor preconditioning cloud surrounding a central narrow flowing find stream of fluid under pressure. A discharge device is connected electrically to the fluidjet pinch device for supplying an electrical flow through a portion of the fluid stream for establishing an incoherent light emitting plasma therealong. A method of using the plasma pinch system for manufacturing semiconductors, includes exposing a semiconductor wafer to the incoherent light emitted by the plasma for either annealing or etching purposes. |
申请公布号 |
CA1307356(C) |
申请公布日期 |
1992.09.08 |
申请号 |
CA19880585143 |
申请日期 |
1988.12.06 |
申请人 |
REGENTS OF THE UNIVERSITY OF CALIFORNIA (THE) |
发明人 |
ASMUS, JOHN F.;LOVBERG, RALPH H.;BOYER, KEITH |
分类号 |
C23F4/00;G03F7/20;H01J61/72;H01L21/02;H01L21/268;H01L21/302;H01L21/3065;H05H1/04;H05H1/52 |
主分类号 |
C23F4/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|