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发明名称
INSULATING FILM AND ITS FORMATION, FORMATION OF INSULATING-FILM PATTERN AND MANUFACTURE OF SEMICONDUCTOR DEVICE
摘要
申请公布号
JPH04252031(A)
申请公布日期
1992.09.08
申请号
JP19910008184
申请日期
1991.01.28
申请人
NEC CORP
发明人
SAMOTO NORIHIKO
分类号
H01L21/302;H01L21/306;H01L21/3065;H01L21/314;H01L21/3205
主分类号
H01L21/302
代理机构
代理人
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